Digital optical chemistry micromirror imager

ABSTRACT

An apparatus and method for catalyzing a reaction on a substrate ( 24 ) comprising, a light source ( 12 ), a micromirror ( 16 ) positioned to redirect light ( 14 ) from the light source ( 12 ) toward a substrate ( 24 ) wherein the redirected light ( 14 ) catalyzes a chemical reaction proximate a substrate ( 24 ), is disclosed. A computer ( 18 ) is connected to, and controls, the positioning of mirrors within the micromirror ( 16 ) to specifically redirect light to specific portions of a substrate. The substrate ( 24 ) can be placed in a reaction chamber ( 50 ), wherein the light ( 14 ) that is redirected by the micromirror ( 16 ) catalyzes a chemical reaction proximate a substrate ( 24 ).

CROSS-REFERENCE TO RELATED APPLICATIONS

This application claims priority under 35 U.S.C. § 119(e)(1) ofprovisional patent application No. 60/087,948, filed Jun. 4, 1998.

TECHNICAL FIELD OF THE INVENTION

The present invention relates in general to the field of opticalchemistry, and more particularly, to an apparatus and method forconducting a light directed chemical synthesis or reaction on asubstrate using a computer controlled digital light processingmicromirror array.

BACKGROUND OF THE INVENTION

Without limiting the scope of the invention, its background is describedin connection with the patterning of a photolithographic emulsion forthe fabrication of electronic devices for use in large scaleintegration, as an example.

Heretofore, in this field, photolithographic patterning of integratedcircuits has depended on the formation and images with visible orultraviolet light in a photoresist. To achieve large scale integrationof electronic circuit devices, photoresist is patterned is currentlyachieved using proximity or projection printing. Proximity or projectionprinting of photolithographic patterns on substrates such as singlegrain silicon, depend on the printing of a lithographic mask on, e.g.,fused-silica.

One problem with photolithographic masks is the degradation of the maskwith each exposure to high intensity light or other rays. For example, afused-silica mask that is used to pattern a large, dense semiconductorchip can have a useful life as low as two hours. Furthermore, theformation of masks requires a separate process, akin to waferfabrication, in which the masks are patterned on a ultraviolettransparent material, usually having a metallic overcoat into which thepattern is etched. The entire mask producing process is akin to waferfabrication in that similar care must be taken to prevent contaminationwith particulate matter from processing reagents and the atmosphere inwhich the masks are created and handled. The mask process is also verycostly, cost which is further accentuated by the difficulty in makingreliable, long lasting masks. Also, the turnaround time for mask makingmakes rapid changes to designs somewhat prohibitive.

A number of problems are encountered using masks for a wide variety ofapplications. For example, U.S. Pat. No. 5,626,784, issued to Simons,discloses a method for improving the alignment of photolithographicmasks using a frame having sides that are individually thermallyexpandable. The mask is fabricated to be undersized so that the distancebetween fiducials on the mask is less than a desired distance, which maybe the distance between corresponding fiducials on the workpiece. Themask is mounted on the frame, and at least one side of the frame isheated to expand the side and stretch the mask to achieve the desiredinterfiducial distance. While alignment of a mask is improved using themethod disclosed, masks for each of the steps requiring photoresist arestill required. Also, with each step requiring a mask, the above methodhas to be repeated to accomplish the underlying photoresist patterning

SUMMARY OF THE INVENTION

It has been found that present apparatus and methods fail to meet thedemands for a low cost, efficient, customizable method of small scalepatterning for use in the creation of arrays for read-out systems thatare capable of overlapping, concurrent data acquisition and analysis.Present patterning techniques also require the creation of masks foreach step that involves the patterning of a photoresist during theformation of integrated circuits.

In the area of semiconductor design and manufacturing, a significantproblem of current systems is that during the formation of semiconductorchips a number of photolithographic masks must be custom designed andprinted for steps that require photolithographic protection of portionsof a substrate. Each steps that requires photolithographic masks to,e.g., protect portions of semiconductor layers during etching or blanketdeposition of semiconductor device layers, must be fit with a uniquemask. Furthermore, each mask must be closely aligned to achieveefficient formation of major semiconductor components. The cost ofimplementation of novel designs for semiconductor devices is greatlyincreased by the need to design, print and pattern each mask separately.What is needed to design, test and implement integrated circuit designchanges, therefore, is a rapid, inexpensive apparatus and method forpatterning a photoresist on a semiconductor substrate that uses existingtechnology.

Current biochip technology is based on principles not unlike theformation of integrated circuit devices on a semiconductor substrate ortemplate. It is recognized, as disclosed herein, that current biochipfabrication technology is afflicted by the same inefficiencies intrinsicto the use of photolithography to pattern and protect light catalyzedchemical reactions on active and inactive substrates. The presentinvention is based on the recognition that photolithographic masks areincapable of being designed, printed and used, at a reasonable cost toachieve the needed diversity for arrays of, e.g., oligonucleotide,polypeptide arrays or small chemical molecules. During large scaleresequencing, for example, the ability to create a system fordetermining nucleotide sequences having a large diversity based on datapreviously obtained from an automated sequencer.

More particularly, the present invention can be an apparatus forcatalyzing a reaction on a substrate comprising a light source that isdirected toward a micromirror positioned to redirect light from thelight source toward a substrate. A computer is connected to, andcontrols, the micromirror and a substrate holder, such as a reactionchamber, that is placed in the path of light redirected by themicromirror, wherein light that is redirected by the micromirrorcatalyzes a chemical reaction proximate the substrate. By proximate itis meant that the light catalyzed reaction can occur on or about thesurface of the substrate. A light source for use with the presentinvention is a lamp or laser, such as a UV light. In an alternativeembodiment the light source can be, e.g., a xenon lamp, or a mercurylamp, or a laser or a combination thereof. The light produced by thelight source can also be visible light. One advantage of catalyzingchemical reactions using UV light is that it provides photons having therequired high energy for the reaction. UV light is also advantageous dueto its wavelength providing high resolution. Lenses can be positionedbetween the light source and the micromirror, which can be a micromirrorarray, or between the micromirror and the substrate. An example of sucha lens is a diffusion lens.

Light from the light source can interact with, e.g., a novolak resinproximate to the substrate to produce a negative or a positive patternin photoresist. The light catalyzed synthesis or reaction can be, e.g.,the addition a nucleotide base to the substrate or to a base orpolynucleotide chain attached to the substrate. Likewise, the lightredirected by the micromirror can catalyze a chemical reaction, e.g., anamino acid addition reaction or the addition, removal or crosslinking oforganic or inorganic molecules or compounds, small or large. Forexample, during the addition of a nucleic or an amino acid residue, thelight can deprotect protecting groups of, e.g., phosphoamiditecontaining compounds. Light can also be responsible for the crosslinkingor mono-, bi-, or multi-functional binding groups or compounds to attachmolecules such as, fluorochromes, antibodies, carbohydrates, lectins,lipids, and the like, to the substrate surface or to moleculespreviously or concurrently attached to the substrate.

The present invention can also be a method of patterning on a substratecomprising the steps of, generating a light beam, illuminating amicromirror with the light beam, redirecting the light beam with themicromirror onto a substrate and catalyzing a light sensitive reactionproximate to the surface of the substrate using the redirected lightbeam in a predetermined pattern. By using the method of the presentinvention as a series of cycles, a number of layers can be built on thesubstrate or strings of molecules can be built having a large diversity.The method of the present invention can further comprising the step ofcontrolling, using a computer, the micromirror, which can be a lightmirror array such as, e.g., a Texas Instruments Digital Light Processor.The illuminating light beam can be a UV, or other light source that iscapable of catalyzing a chemical reaction, such as the formation of apositive or negative photoresist. The present method can also be usedfor the in situ addition or removal of organic or inorganic molecules orcompounds, as will be known to those of skill in the art ofphotochemistry.

The method of the present invention can further comprise the step of,obtaining a substrate, and depositing a novolak resin on the substrateprior to redirecting the light beam to the photoresist. The method mayalso comprise the steps of positioning a substrate with a reactionchamber, flooding the surface of the substrate with a light catalyzablereaction chemical, such as a nucleotide or amino acid residue, andexposing the chemicals reagents light. A light catalyzable reactionchemical is activated and a reaction synthesis or decomposition iscaused by light at the location where the micromirror redirects light onthe substrate, but not where the micromirror does not redirect light.The present invention can be used, e.g., in “stepper” fashion, whereinthe micromirror is directed at a portion of the substrate, that portionof the substrate exposed to light from the micromirror, and then steppedon to a different portion. The new portion of the substrate exposed canbe, e.g., overlapping or adjacent to the first portion.

BRIEF DESCRIPTION OF THE DRAWINGS

For a more complete understanding of the features and advantages of thepresent invention, reference is now made to the detailed description ofthe invention along with the accompanying figures in which correspondingnumerals in the different figures refer to corresponding parts and inwhich:

FIG. 1 is a diagram of the basic physical components of a micromirrorimager;

FIG. 2 is a diagram of the basic principles underlying a micromirror;

FIG. 3 is a diagram that represents a micromirror imager system;

FIG. 4 is a diagram of an alternative lens mirror configuration forfocusing the light using the micromirror array;

FIG. 5 is a flowchart of the steps involved in the use of a micromirrorarray to conduct an in situ light catalyzed reaction;

FIG. 6 is a physical mask produced using the present invention; and

FIG. 7 is a digital image scanned of a substrate onto which afluorochrome bound to a phosphoamidite base, which was attached usingthe present invention.

DETAILED DESCRIPTION OF THE INVENTION

While the making and using of various embodiments of the presentinvention are discussed in detail below, it should be appreciated thatthe present invention provides many applicable inventive concepts whichcan be embodied in a wide variety of specific contexts. The specificembodiments discussed herein are merely illustrative of specific ways tomake and use the invention and do not delimit the scope of theinvention.

Digital Optical Chemistry System

The present invention uses Digital Light Processing technology (TexasInstruments, U.S.A.) with optical deprotection photochemistry (e.g.,Affymetrix, U.S.A.), to create an apparatus and method for generatingDigital Optical Chemistry (DOC) high diversity arrays. The presentinvention overcomes the limitations of the traditional mask-basedphotolithographic processes by eliminating the need for a mask. Thepresent invention is also based on the recognition that DLP systems canbe used to pattern photoresist for the fabrication of substrates, e.g.,semiconductor substrates. The present invention thus overcomes theproblem of manufacturing and printing photolithograhic masks forconventional photoresist patterning. The present invention can be madeas a portable platform for the construction of unique high-densityarrays.

FIG. 1 shows a depiction of a basic micromirror imager 10. Themicromirror imager 10 has a light source 12 which produces light 14,which can be a light beam. The light 14 can be, e.g., a Xenon lamp, amercury lamp, a UV light source or other light sources for use withlight catalyzed chemical reactions. The choice of light source willdepend on the exact photochemistry required or chosen, as will be knownto those of skill in the art of photochemistry. The light 14 isredirected or deflected by a micromirror 16, such as a Digital LightProcessor (DLP) micromirror array (Texas Instruments, U.S.A.). Otherlight deflection systems may be used with the present invention,including an individual mirror, or other light deflection system. Acomputer 18 is depicted controlling the positioning of individualmirrors of the micromirror 16 based on a pattern 20. The micromirror 16deflects the light 14 into a lens 22 that can focus or diffuse the light14 to illuminate a substrate 24. Lens 22 can be magnifying ordemagnifying, to set the size of the features on the substrate 24. Theapparatus may also contain a shutter (not depicted) positioned betweenthe light source 12 and the micromirror 16 in order to increase theaccuity of light 14 delivery to the micromirror 16. The shutter may alsohelp increase the life-time of the micromirror 16 by decreasing theextent of direct and incident light that strikes the array of mirrors.Substrates 24 that can be used with the present invention include, e.g.,silicon, gallium arsenide, silicon on insulator (SO) structures,epitaxial formations, germanium, germanium silicon, polysilicon,amorphous silicon, glass, quartz, or gel matrices and/or likesubstrates, nonconductive, semi-conductive or conductive.

FIG. 2 shows a diagram illustrating the basic principles underlying amicromirror 16. Light 14 strikes a pixel mirror 26, which rotates arounda central axis having a plus or minus ten degree rotation. The incidentangle of deflection of the mirror, which for an aluminum DLP-typemirror, is 20 degrees. At plus 10 degrees light is reflected by thepixel mirror 26 into lens 22 and onto the substrate to form a light spot28 of pattern 20. At any other angle the light is not deflected into thelens and therefore appears as a dark spot 30. Gray scale, which can beused with the present invention in some circumstances, is achieved byfluttering the pixel mirror 26 to produce the analog equivalent of agray scale image on pattern 20.

FIG. 3 shows a diagram representing a micromirror imager system 40. Themicromirror imager or DOC system of the present invention comprisesgenerally three parts, a DLP micromirror system 34 that selectivelydirects light 14 onto a substrate 24 on which the reactions areconducted, a fluidics system 36 that delivers the photoactivatablereagents in proper sequence and a computer system 38 with software thatcontrols the DLP micromirror system 34 according to the desired pattern20. The micromirror imager system 40 can be used to create individualspots, 20 microns or smaller in size, on a substrate 24 such as glass,with up to 2 million spots per substrate using the present invention.

The present invention can also be applied to combinatorial chemistryproblems and the manufacture of custom microelectronics. An importantfinding of the present invention was the recognition that the DLP systemcould be used to reflect light in the UV range. Light processingsystems, such as the DLP created by Texas Instruments, was intended tobe the next generation of high resolution, very bright, color true TVsets, computer monitors/projectors and movie projectors. The DLP isdesigned to reflect light in the visible range with a high brightnessand brightness efficiency, goals that are presently unattainable byconventional liquid crystal display units. More information on thesystem is available at “www.ti.com/dlp/”, relevant portions of which areincorporated herein by reference.

The micromirror imager system 40 is designed as a simple device on whichto do synthesis (oligo or combinatorial chemistry) using, e.g., opticaldeprotection. As with the basic system depicted in FIG. 1, theillumination of a given area of an substrate 24 is controlled by aDigital Light Processor (DLP) micromirror 16. The pattern 20 iscontrollable by controlling the mirror angle using an image on a VGAmonitor that is sent by the computer 18 through the DLP system. Forexample, one mirror can be used for each pixel on the 640×480 screen.The mirrors of the micromirror 16 are each individually controlled, withthe ability to rock its angle on a 2 ms time scale. Grey scales arecreated by rapidly moving a mirror to project and then not project on agiven position.

The substrate 24 is mounted in a custom reaction chamber 50 into whichchemicals are pumped. The chemicals, including all the standardchemicals for oligonucleotide synthesis, for example, can be kept insyringes and pumped manually to the reaction chamber 50 through achemical line 48. Alternatively an automated fluidics system 36, asdepicted in FIG. 3 can be used to control the input and output ofreagents into and out of reaction chamber 50. In this example, thesubstrate 24 is illuminated from above with light passing through thesubstrate 24. If the substrate 24 is not light opaque the synthesis cantake place on either side of the substrate. As will be apparent to thoseof skill in the art of optics, light can be reflected from a substrate24 that is not light opaque, wherein the light catalyzable reactionoccurs at the site of reflection or absorption. The reaction chamber 50can be moved to make multiple arrays at different positions on thesubstrate 24.

The fluidics system 36 of the present invention can include a number ofreagent bottles containing synthesis chemicals 46. The synthesischemicals 46 can be, e.g., placed under pressure under a non-reactiveatmosphere, e.g., Argon or Helium, to provide pressure for chemicaldelivery and to reduce premature oxidation of the synthesis chemicals46. Valves 44, under the control of a computer such as computer 18 canbe used to control the timing of the synthesis chemical or chemicals 46delivered through chemical line 48 to the reaction chamber 50.

FIG. 4 is a diagram of an alternative lens mirror configuration forfocusing the light using the micromirror 16. A light source 12 ispositioned to illuminate a prism set 62. Light from the light source isfocused onto the prism set, which in this example is a total internalreflection (TIR) mirror that deflects the light from the mirror surfaceinto the pattern 20 that has been delivered to the micromirror 16. Lightreflected by the individual mirrors then traverses the prism set intolenses 22, which can be diffusion lenses. The patterned light strikes areaction chamber, depicted in this figure as a slide holder 60. Twoslides 56 are positioned within the slide holder 60. As can be seen fromthis cross-sectional view of the slide holder 60, a light translucentcover 64 is disposed over the reaction chamber 50. Synthesis chemicalscan be pumped into, and evacuated from the reaction chamber 50 throughchemical inlets/outlets (not depicted) positioned to be in fluidcommunication with the interior 66 of the reaction chamber 50. As viewedfrom the cross-sectional view it is apparent to those of skill in theart, in light of the present disclosure, that reaction chemicals can bedelivered to the interior 66 of the reaction chamber 50 from differentpositions, such as the sides, top or bottom of the reaction chamber 50.

FIG. 5 is a flow chart of the steps involved in the use of a micromirrorarray to conduct an in situ light catalyzed reaction. In step 72 apattern design in created using a computer. The design can be, e.g., aphotolithographic pattern to be formed on a photoresist for asemiconductor integrated circuit. Alternatively, the pattern can reflectthe sequence of poly-nucleotides or peptides that are to be conjugatedin that particular step. One advantage of the present system is thatpatterns of photoresist may be deposited and/or developed in sequence atthe same time that chemical reactions are being catalyzed.Alternatively, the pattern/catalysis reactions may occur in apre-determined set of cycles that take advantage of photoresist layeringand the light sensitivity of chemical reactions.

The pattern is transferred to the micromirror 16 in step 74. Thesubstrate is then exposed to reaction reagents or chemicals, e.g., byflooding a reaction chamber 50. In step 78, the micromirror 16 is usedto reflect light in the previously transferred pattern to the substrate,wherein a light catalyzed reaction takes place at the site or siteswhere light strikes the substrate 24. The reaction can be to conjugatedirectly onto the substrate 24 or can cause a reaction to occur oncompounds or layers attached to, or disposed on, the substrate 24. Adecision box 82 is reached, and if the last patterning step has occurredthen the process ends 84. If more patterning and catalytic steps arerequired, the process returns to step 74, wherein a previously designpattern from step 72 is transferred to the micromirror 16 to continuedirecting light catalyzed reactions on or about the substrate 24surface.

Following are the specifications and characteristics for one embodimentof the micromirror imager system 40 of the present invention:

Control computer—PC with VGA monitor

Software—Image created using PowerPoint, custom Software or CAD software

Digital Light Processor—TI DLP with 640×480 resolution

Number of pixels—640×480=307,200

Mirror material—Aluminum

Mirror reflectivity—88%, Verified using monochromater/PM tube in our labfor visible and UV wavelengths

Mirror size—16 microns×16 microns in a 20 micron×20 micron space

Synthesis spot size—1:1 with mirror size

Mirror switching speed—2 ms

Light source—100 W mercury burner with peak at 365 nm

Light brightness—170,000 cd/cm2=250 W/(cm2*st)

Luminous Flux—2,200 lumens

Reaction chamber—custom from teflon, delrin and aluminum

Reagent delivery—syringe injectors into header

Sample configuration—coated microscope slides

Microscope slide transparency—5%@280, 40%@300, 75%@320, 87%@340,88%@360, 89%@400, measured using spectrophotometer

Exposure time—3 minutes per coupling reaction.

The apparatus and method of the present invention has been used to: 1)show that the mirror array can project UV light (UV light cannot bepassed through conventional liquid crystal displays) at sufficientintensity to conduct photochemistry, 2) demonstrate that images at thefocal plane can be created, and 3) demonstrate the use of the apparatusand method photodeprotection chemistry to make an patterned substrate.

FIGS. 6 and 7 are drawings that represents the results from using thepresent invention to conduct a spatially controlled oligonucleotidesynthesis using light projected with the micromirror imager system 40.FIG. 6 shows an array with a screen mask on a glass slide. The darkareas are 0.2 mm in width with a 10× magnification. The pattern wascreated by UV directed oligonucleotide synthesis, and was labeled usingCY3 dye (Molecular Probes, Inc., U.S.A.). FIG. 6 was taken using anepi-flouresence microscope (Olympus, Inc., U.S.A). FIG. 7 shows CY3 dyeconjugated oligonucleotide bases to fluoresce regions of oligonucleotidesynthesis, taken using a laser scanning fluorescence system (GeneralScanning, Inc., U.S.A.). The micromirror was set to fully illuminate thechamber, and reaction chamber 50 was used to synthesizeoligonucleotides.

Micromirror System Optics

The optics for use with the present invention can be designed tomaintain the system focus while substantially increasing the contrastratio. A high contrast ratio is critical to obtain high qualitydifferential synthesis which is a function of UV intensity and exposuretime. The critical component to obtaining higher contrast ratios is theTIR (Total Internal Reflectance) prism, depicted in FIG. 4, that escortsthe UV light from the source onto the substrate and then out to thefocusing optics. These optics can be customized for a particular DLPwith, e.g., UV transparent glass (BK5, SF5 or K5). The use of a TIRprism is not necessary, as the apparatus and method of the presentinvention has been used with direct projection via a mirror set having20 degrees off-axis of the micromirror 16 to match the cant angle of theindividual mirrors and lenses. The TIR prism and lens 22, e.g., Acromatdoublets or triplets, can be made from UV transparent fused silica (manytypes are available for 365 nm, near UV).

A high power UV source can be used, e.g., a power source of up to 1 kWcan be used before reaching a damage threshold for the micromirror 16.Also, an automated liquid handling system can be constructed, fashionedfrom that used in the MerMade Oligo Synthesizer (UTSW Medical Center,U.S.A.) or other commercially available synthesizers (BeckmanInstruments or Applied Biosciences, Inc., U.S.A.). Reagents can be keptin, e.g., Argon pressurized bottles and dispensed through teflon coatedvalves 44 under computer control. A National Instruments digital I/Oboard can be installed in the Macintosh control computer, followed by asolid state relay system that provides the level of current necessary torun the valves 44, which can be e.g., microvalves. Under computercontrol, the valves 44 can be opened between 100 msec and 1 sec,depending on the amount of reagent to be dispensed. The control softwarefor the valves 44 can be Labview or other custom codes written in e.g.,C or other computer languages. Pressurized bottles and valves 44 can beprovided for each reagent.

The reagents will be delivered to, e.g., the slide holder 60 on whichthe light is projected. The slide holder 60 can be fabricated fromTeflon, with slides sealed using o-rings. Two slides can be sandwichedwith the reagents pumped between them. The two slide sandwicharrangement allows for the manufacture of two slides, concurrently, andminimizes the scattered light for excess light is projected throughsandwich. The entire sandwich can be clamped together and Luer lockfittings will be used to attach the liquids.

The substrate, slide(s) or other surface for use with the invention maybe made of different materials, such as silicon, glass or quartz. Theslides may also have patterns on the surface that are useful forincreasing the attachment of compounds. Additionally, the slide surfacemay be formed or modified to increase the surface area and consequentlythe amount of material that is formed, deposited or catalyzed on theslide surface. One example of a modified surface area slide for use withthe invention is a microchannel slide that has a number of grooves orchannels throughout the slide that increase the surface area of theslide. Another examples of a surface enhancing feature include: dimples,holes, scratches and fibrous deposits or mesh.

It should be noted, that once produced, the DOC slide arrays when used,can have a modified hybridization protocol. Possible adjustments willinclude temperature, time, sample concentration, buffer and washconditions. These can be resolved depending on the background and signalto noise ratio encountered with an initial DOC slide. Once the DOC hasbeen manufactured, however, the same slide can be stripped and reusedfor the next hybridization cycle with new conditions. Alternatively, theimage acquisition can be recalibrated to take into account increasedbackground signal to improve the signal to noise ratio throughadjustments, manual or automatic, to the data acquisition software. Infact, sample data can be taken from the positive and negative controlson the DOC slide by, e.g., placing the positive and negative controls inthe first line of samples to be scanned, and adjusting the calibrationfor the entire DOC chip before any more data acquisition continues.

Photoprotection Chemistries for Improved Coupling Yield

The critical step with light-directed synthesis of DNA arrays on glasssupports is the rate of photolytic release of the 5′-protecting groupwhich is related to the reaction quantum efficiency. For the2-nitrobenzylic compounds to be used in proposed research, the 365 nmemission of the Hg lamp is almost exclusively responsible forphotochemistry due to its chromophore absorbance (λ_(max)=345 nm,ε=5×10³M⁻¹ cm-1). The photocleavage half-lives obey an inverse-lineardependence on light intensity and saturation of the excited state wasnot found over the range of 5-50 mW/cm at 365 nm. This indicates that,in principle, even higher intensity light, such as provided by anitrogen laser, could be used to shorten exposure times.

Solvent effects reveal that photocleavage rates proceeded rapidly underdry conditions, or when the substrate was maintained under a nonpolarsolvent such as toluene or dioxane. To date, most of the photoremovableprotecting groups have been derivatives of 2-nitrobenzylic compounds.Both the structure of the nitrobenzyl moiety and the atom to which it isattached have some effect on the efficiency and wavelength required forcleavage. By changing substituents in the aromatic ring and at thebenzylic carbon, improved efficiency of deprotection can beaccomplished. Also, different types of protecting groups that exhibitmuch higher photolysis rates and quantum yields can be used. One of thepossible candidates can be desoxybenzoinyl (desyl) derivatives, whichhave much higher photolysis quantum rates and therefore can be cleavedmuch faster. In addition, the photo by-product is inert and photolysisis efficiently performed at 360 nm.

Fluorochromes or dyes for use with the present invention will depend onwavelength and coupling structure compatibility. By means of example,Fluorescein-5-EX, 5-SFX, Rhodamine Green-X, Bodipy FL-X, Cy2-OSu, FluorX, 5(6)TAMRA-X, Bodipy TMR-X, Rhodamine Red-X, Texas Red-X, Bodipy TR-X,Cy3-OSu, Cy3.5-OSu, Cy5-Osu and/or Cy5.5-OSu, may be used if desired.

High density arrays of oligonucleotide (or other) probes are an emergingtechnology for research and potential clinical diagnostics. Arrays of upto 65,000 oligos, manufactured using conventional photolithographicmethods are now available commercially from Affymetrix/Hewlett Packard.These arrays are used for resequencing and expression studies viahybridization to the array. These chips currently have feature sizes of20 microns.

The present invention can provide a handling system for the design,deposition and formation of biological samples on slides. Furthermore,unlike biochips that are expensive to make and have a reduced yield dueto the underlying electronics, the present invention does not sufferfrom high initial cost to set up a manufacturing run. Nor does thepresent invention require a long time to make a sequence change on thearray. The inability to make an arbitrary sequence at an arbitraryposition within the array, and low coupling efficiency have contributedto the need to search for alternatives to existing biochips.

Slide Sample Chemistry

One example of slide sample preparation for use with the micromirrorimager 10 disclosed herein is the use of light catalyzed chemistry.Light catalyzed chemistry can be used to attach to, e.g., a glass slide,nucleic and amino acids, lipids, carbohydrates or inorganic or organicmolecules that can be used to detect known and unknown molecules. Forexample, nucleic acids segments, such as oligonucleotides can beattached to detect the presence of complementary or hybridizing nucleicacids. The strength of the interaction between the nucleic acid on theslide and the analyte can be varied as is known to those of skill in theart, e.g., changes in salt concentration, temperature of hybridization,etc. Interactions with proteins and even cells can be measured byattaching, e.g., receptors or ligands to the slide surface to measurebinding. As with nucleic acid interactions, interactions with receptorsor ligands can be affected by the presence or absence or, e.g.,cofactors, competitors and the like.

As an example, the formation of nucleic acids on the substrate surfaceare used as an example. More conventional chemistries may also be usedto attach molecules to the substrate surface, depending on the nature ofthe substrate, the molecules that are being attached and other factorsthat will be known to those of skill in the art of chemical attachmentand synthesis.

The chemistry for light-directed oligonucleotide synthesis using photolabile protected 2′-deoxynucleoside phosphorarnites has been developedat, e.g., Affymetrix, U.S.A. The basics of one type of photo-labileprotection chemistry are explained in U.S. Pat. No. 5,424,186, whereinrelevant explanations of basic photochemistry techniques and compoundsare incorporated herein by reference.

For example, the reaction of commercially available 3,4-(methylenedioxy)acetophenone with nitric acid followed by ketone reduction, andtreatment with phosgene gives chloroformate. Then 5′-hydroxyl ofN-acyl-2′-deoxynucleosides reacts with chloroformate, and 3′-hydroxylreacts with 2′cyanoethyl N,N,N′,N′-tetraispropylphosphorodia-midite toyield photo labile protected phosphoramidites.

Standard phosphoramidite chemistry is adapted to include photo labileprotecting groups by replacing the 5′-protecting group DMT, andincorporating photoactivateable hydroxyl linker into the synthesissubstrate. Hydroxyl groups are selectively deprotected by irradiation ata wavelength of 365 nm, and oligonucleotides assembled using standardphosphoramidite chemistry.

Micromirror Imager for Use with Expression Analysis

To study gene expression in mammalian and amphibian cells, the presentinvention can be used conduct studies using the genetics of yeast, as anexample. With the entire sequence available for yeast, it was possibleto search the Expressed Sequence Tagged subset of GenBank to identify ina quantitative way the expression levels of each yeast ORF. Theavailable data allowed for an image to be obtained and compared to,e.g., known genes. Given genes necessary for the operation of the basiccellular machinery of yeast have overlap with other cell types,especially other eukaryotes, it is possible to inspect the data todetermine candidate genes for particular disease conditions or geneticanalysis.

For example, statistically relevant expression analysis can be done bysequence similarity searching of all query open reading frame or genesequences against expressed sequence tagged cDNA sequence libraries.These libraries, because of their large size, have enabled statisticallyrelevant comparative genomics studies of S. cerevisiae to EST sequencesof all species represented, and with human ESTs by tissue type. Allyeast ORFs (6,217) were analyzed by sequence similarity searching usingsppBLASTn against the GenBank EST database (Issue 104.0, Dec. 15, 1998).This database contains 1,377,132 EST sequence files (493.6 million bp).

Polymerase Chain Reaction Polymerase Chain Reaction (PCR) products,cDNAs, oligonucleotides and DNA fragments have been spotted in excess onglass using the micromirror imager 10 of the present invention, ashigh-density hybridization targets. Fluorescently labeled cDNAs derivedfrom cellular extracts of mRNA have achieved a dynamic range (detectionlimit) of 1 in 10,000 to 100,000, allowing for detection of message inlow and high abundance. Many experiments to measure differentialexpression have been reported for yeast, Arabidopsis and human DNAs.Presently, comprehensive and concise data on quantitative analysis ofgene expression are available. Use of known expression data can be usedto predict and measure known expression patterns havingclinical/clinical research application with unknown samples to obtainreal-time expression data.

The present invention can be used with existing photochemical protocols,in conjunction with known expression levels for preselected and knowngenes, to optimize gene expression analysis using multiplexing of querysamples by using a number of dyes and substrate produced using themicromirror imager 10. The micromirror imager 10 can be used to producea substrate for use in identifying the expression levels of every geneof as entire organism such as yeast, at one time. For example, themicromirror imager 10 can be used for the gene networks study project ofthe National Institutes of Health-National Cancer Institute (NIH-NCI) byproviding substrate arrays having the required diversity andsensitivity. The gene networks study involves the identification ofyeast gene pathways by measuring the expression level of all 6,217 openreading frames (ORFs) in response to a systematic knockout of each gene(ORF). Using substrates produced using the micromirror imager 10disclosed herein, the expression level of every yeast gene in everyyeast gene knockout can be determined by designing and fabricating ahybridization substrate for analyzing the expression of multiple yeastgene knockouts per substrate, at a greatly reduced cost, with greaterefficiency and in less time.

During expression analysis the micromirror imager 10 can be used toproduce a substrate 24, such as a slide that can be used for specifichybridization of each of the ORFs in a genome. For example, ahydridization matrix can be disposed on a substrate 24, such as a glassor quartz slide. Complementary DNA can be produced from mRNA, tagged andplaced on the hybridization matrix. Tagged, expressed genes arespecifically hybridize with the hybridization matrix and the expressedgenes are quantitated by moving the substrate 24 that has beenhybridized past scanning hardware. The location and level of expressionof known genes can be used as positive and negative controls tocalibrate the sensitivity of the analysis.

A charge coupled display (CCD) camera connected to a microscope can beused to capture the fluorescence level on the hybridization matrix. Thedigital data captured by the CCD camera is sent to a computer thatmatches the position on the hybridization matrix of the specific genesequence created using the micromirror imager 10. The level offluorescence is compared to known expression level controls also on theslide, and the level of expression of each ORF is determined. Data canbe displayed in real time, or can be stored for future analysis.

Software for analyzing high density grid hybridizations has beendeveloped for use with the present invention. The software has been usedto analyze over 260 images containing 1536 colonies spotted on membranesusing a spotter system. The software application was developed usingmacros for IDL, a widely used commercial software package. IDL is acomplete, integrated software environment for data analysis,visualization, and application development, made by Research Systems,Inc. (http://www.rsinc.com). Capture images are imported as either8-bit, or 16-bit Tiff files. Key components of the analysis includespot-finding, spot-quantification, and spot addressing. The 12-bitcamera output can be padded to 16-bits. The slide image can also beanalyzed for constant intensity level contours satisfying the followingconstraints: the contour is closed (around a spot), the enclosed area isabove a minimum area threshold and below a maximum area threshold, andthe spot-integrated intensity is above a minimum intensity thresholdrelative to background. The user is presented with software controls(widget sliders) to define the parameters min_area, max_area, andmin_intensity within the user interface so that the analysis isautomatic and quick. The numerical parameters that set the gradation ofthe contours and the coarse-graining to define the local backgroundintensity are also adjustable. Once spots are identified and quantified,the centroid of each spot is associated with a unique grid-cell thatdefines the spot's address in the array. This process avoidsquantification errors associated with strong signals bleeding intoneighboring cells. While this invention has been described in referenceto illustrative embodiments, this description is not intended to beconstrued in a limiting sense. For example, the term “computer” as usedherein is to include any control apparatus capable of actuating amicromirror or micromirror array. Various modifications and combinationsof the illustrative embodiments, as well as other embodiments of theinvention, will be apparent to persons skilled in the art upon referenceto the description. It is therefore intended that the appended claimsencompass any such modifications or embodiments.

1.-38. (canceled)
 39. An apparatus for catalyzing a reaction on asubstrate comprising: a ultraviolet light source; a micromirrorpositioned to redirect light from the light source toward the substrate;a reaction chamber disposed about the substrate; one or more chemicallines connected to the reaction chamber; one or more chemicals connectedto the chemical lines; and a computer connected to, and controlling, themicromirror and the supply of the one or more reaction chemicals to thereaction chamber via the chemical lines, wherein a light catalyzablereaction occurs proximate to the site where light produced by the lightsource and redirected by the micromirror strikes the substrate.
 40. Theapparatus of claim 39, further comprising a lens between the micromirrorand the substrate.
 41. The apparatus of claim 40, wherein the lenschanges the magnification of light reflected by the micromirror.
 42. Theapparatus of claim 39, wherein the micromirror is further defined as amicromirror array.
 43. The apparatus of claim 39, wherein the lightcatalyzes the synthesis of a nucleotide base proximate the substrate.44. The apparatus of claim 39, wherein the light catalyzes the synthesisof an amino acid residue proximate the substrate.
 45. The apparatus ofclaim 39, wherein the light catalyzes a reaction involving a moleculeproximate the substrate.
 46. The apparatus of claim 39, wherein thelight crosslinks a molecule proximate the substrate.
 47. The apparatusof claim 39, wherein the light source is a xenon lamp, or a mercurylamp, or a laser or a combination thereof.
 48. The apparatus of claim39, wherein the light interacts with a novolak resin proximate thesubstrate to produce a photoresist pattern.